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The NEW LEP400 Etch Depth Monitor

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Benefits

Operation

Benefits

The LEP400 enables plasma etch users to decrease process development time & manufacturing costs

AND increase yield & product performance through...

Real time, in-situ measurement and control. Unlike other techniques, you can monitor the etch as it proceeds through a bulk layer...you don't need material interfaces or an etch stop layer!
Predictive modelling software – reduce material waste & process development time
			Data reprocessing to decrease process optimisation time. An ideal tool to seamlessly progress from R&D to full volume manufacturing.
User friendly EtchDirector© software in a Windows® environment – fast and intuitive interface puts you in control. All the tools you require in one easy to use integrated package.
			Integration to etch tool for automated operation. Powerful DIGIO client gives you clear access to the systems IO features.
Fast data acquisition and high noise rejection for accurate termination
			Remote control for through-wall cleanroom implementation